Inorganic QD Photoresist for Next-Gen Energy Efficient Displays

Dr. Danielle Chamberlin, CTO, NanoPattern Technologies

Presentation Abstract

MicroLED display technology is in a period of rapid technological development and different architectures are being evaluated to fit a wide range of market applications from microdisplays to video walls. In particular, color converted architectures using quantum dots have been proposed to enable ease of manufacturing as compared to RGB displays assembled from direct emitting LEDs. InGaN and AlGaInP have been proposed for direct emitting red microLEDs, while quantum dot conversion of red by InP quantum dots has been proposed from both blue and UV InGaN LEDs. Efficiency, color gamut and resolution are critical factors in choosing a microLED architecture. We have modeled the efficiency tradeoffs of these architectures based on a meta-analysis of literature data in combination with experimental results as a function of pixel size. The color gamut of direct and color converted architectures are also calculated from our meta-analysis of literature data, and advantages of different architectures are demonstrated. Potential issues with integration of quantum dots in microLEDs will be discussed, in particular optical absorption strength, efficiency, patterning resolution, and reliability. Mitigation paths to address the challenges of quantum dot integration will be demonstrated with the use of NanoPattern’s proprietary quantum dot photoresist.

Dr. Danielle Chamberlin, CTO, NanoPattern Technologies

Danielle Chamberlin, CTO at NanoPattern Technologies, holds a PhD and MS in Materials Science from UC Berkeley and an S.B. Degree in Materials Science from MIT. She is an expert in optics and optoelectronics ranging from THz to UV. Danielle has deep knowledge in LEDs and nanotechnology from two decades in R&D leadership at Agilent Labs and Lumileds. She holds over 15 patents on topics ranging from biosensors to microLEDs.